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Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance. (linkinghub.elsevier.com)

Authors: Li Z … Hu H Journal: iScience Published: 2026-07-27 DOI: https://doi.org/10.1016/j.isci.2026.116912
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#lithography #materials #imaging #optics

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